JX Advanced Metals Corporation
Notice Regarding Capital Investment (Acquisition of Fixed Assets) for Increasing Production of Semiconductor Sputtering Targets at the Hitachinaka New Plant
JX Nippon Mining & Metals has decided on approximately JPY 23 billion in capital investment to increase production capacity of semiconductor sputtering targets at the Hitachinaka new plant to 1.6 times that of fiscal 2023, with sequential operation scheduled from the second half of fiscal 2027.
Key Figures
- Capital Investment Amount: Approximately JPY 23 billion (Expansion investment at Hitachinaka new plant)
- Production Capacity: 1.6 times fiscal 2023 (Semiconductor sputtering targets)
- Start of Operation: Sequential operation planned from second half of fiscal 2027
AI要約
Overview of Capital Investment
JX Nippon Mining & Metals Corporation has decided to carry out capital investment of approximately JPY 23 billion at the Hitachinaka new plant (Hitachinaka City, Ibaraki Prefecture) to strengthen production capacity of semiconductor sputtering targets, whose demand is rapidly increasing, particularly for AI data centers. This will increase production capacity to 1.6 times that of fiscal 2023, with sequential commencement of operations planned from the second half of fiscal 2027. Utilizing the technologies and know-how cultivated at the existing Isohara plant, the company aims to build an efficient production line.
Future Outlook
The impact of this capital investment on consolidated results for the fiscal year ending March 2026 is expected to be minimal. By expanding production, the company aims to strengthen its presence in the global advanced semiconductor supply chain and establish a stable supply system. The company plans to continue monitoring market trends closely and proactively enhance production capacity.
