JX Nippon Mining & Metals has decided on approximately JPY 23 billion in capital investment to increase production capacity of semiconductor sputtering targets at the Hitachinaka new plant to 1.6 times that of fiscal 2023, with sequential operation scheduled from the second half of fiscal 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Corporation","jir_importance":"\u2605\u2605\u2605\u2605\u2606","jir_publication_date":"2026-03-10","jir_source_link":"https:\/\/japanir.jp\/wp-content\/uploads\/2026\/03\/5016-20260310-01.pdf","jir_short_summary":"JX Nippon Mining & Metals has decided on approximately JPY 23 billion in capital investment to increase production capacity of semiconductor sputtering targets at the Hitachinaka new plant to 1.6 times that of fiscal 2023, with sequential operation scheduled from the second half of fiscal 2027.","jir_summary":"### Overview of Capital Investment\nJX Nippon Mining & Metals Corporation has decided to carry out capital investment of approximately JPY 23 billion at the Hitachinaka new plant (Hitachinaka City, Ibaraki Prefecture) to strengthen production capacity of semiconductor sputtering targets, whose demand is rapidly increasing, particularly for AI data centers. This will increase production capacity to 1.6 times that of fiscal 2023, with sequential commencement of operations planned from the second half of fiscal 2027. Utilizing the technologies and know-how cultivated at the existing Isohara plant, the company aims to build an efficient production line.\n\n### Future Outlook\nThe impact of this capital investment on consolidated results for the fiscal year ending March 2026 is expected to be minimal. By expanding production, the company aims to strengthen its presence in the global advanced semiconductor supply chain and establish a stable supply system. The company plans to continue monitoring market trends closely and proactively enhance production capacity.","jir_financial_highlights":"Capital Investment Amount: Approximately JPY 23 billion (Unknown)\nProduction Capacity: 1.6 times fiscal 2023 (Year-over-Year +60%)\nStart of Operation: Sequential operation planned from second half of fiscal 2027 (Unknown)","jir_category":"","jir_hashtags":"#JXNipponMiningAndMetals, #BusinessStrategy, #SemiconductorMaterials, #CapitalInvestment, #JapaneseStocks","jir_key_figures":"Capital Investment Amount: Approximately JPY 23 billion (Expansion investment at Hitachinaka new plant)\nProduction Capacity: 1.6 times fiscal 2023 (Semiconductor sputtering targets)\nStart of Operation: Sequential operation planned from second half of fiscal 2027","jir_meta_title":"JX Nippon Mining & Metals Invests Approximately JPY 23 Billion to Expand Semiconductor Sputtering Target Production at Hitachinaka New Plant","jir_meta_description":"JX Nippon Mining & Metals Corporation has decided on approximately JPY 23 billion in capital investment to increase production capacity of semiconductor sputtering targets at the Hitachinaka new plant to 1.6 times that of fiscal 2023, with sequential operation scheduled from the second half of fiscal 2027.","jir_og_title":"JX Nippon Mining & Metals to Invest Approximately JPY 23 Billion to Expand Semiconductor Sputtering Target Production","jir_og_description":"JX Nippon Mining & Metals has decided on expansion investment at the Hitachinaka new plant. Production capacity will be increased 1.6 times with operations planned to start from the second half of fiscal 2027.","jir_og_image_url":"\/assets\/og\/company-general_ir.jpg","jir_chart_data_collection":"[]","ir_related_company":7432,"ir_release_date":"","ir_type":"","ir_is_new":false,"ir_document_url":"","jir_ir_type":"business_update","footnotes":""},"sector":[],"importance":[],"class_list":["post-34100","ir_release","type-ir_release","status-publish","hentry"],"yoast_head":"\n